Ammoniacal alkaline cupric etchant solution for and method of re

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156666, 252 795, B44C 122, C23F 100

Patent

active

043199550

ABSTRACT:
An improved ammoniacal alkaline etchant solution and method of reducing etchant undercut for use in etching copper and copper-containing alloy traces on substrates having resist-coated areas and non-coated areas, which reduces the amount of undercutting beneath the resist-coated areas that lie above the copper traces. The improved etchant solution contains an organic undercut inhibitor which can be either 5-nitro-1H indazole or pyrazole and the improved method includes the step of incorporating said organic undercut inhibitor in a standard ammoniacal alkaline cupric etchant solution. The organic undercut inhibitor causes the formation of a bath-insoluble, physically weak, etch-resistant film on the copper substrate. Said film serves to protect the side walls of an etched depression and thereby diminishes undercutting.

REFERENCES:
patent: 3773577 (1973-11-01), Shibasaki et al.
patent: 3948703 (1976-04-01), Kushibe
patent: 4060447 (1977-11-01), Nelson
patent: 4116699 (1978-09-01), Rooney

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ammoniacal alkaline cupric etchant solution for and method of re does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ammoniacal alkaline cupric etchant solution for and method of re, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ammoniacal alkaline cupric etchant solution for and method of re will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1640569

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.