Amine compound, chemically amplified resist composition and...

Details Amine compound, chemically amplified resist composition and... Amine compound, chemically amplified resist composition and...

2006-10-06

2008-12-23

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C549S432000, C549S436000

Reexamination Certificate

active

07468236

ABSTRACT:
Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography.

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