Alternating aperture phase shift photomask having light...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

06933084

ABSTRACT:
The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes a light absorbing film in a conventional aaPSMs to balance the intensity of light through each opening of the photomask. The aaPSM of the present invention is used to make semiconductor devices or integrated circuits.

REFERENCES:
patent: 4178403 (1979-12-01), Sakurai et al.
patent: 4556608 (1985-12-01), Kaneki et al.
patent: 4720442 (1988-01-01), Shinkai et al.
patent: 5451543 (1995-09-01), Woo et al.
patent: 5460908 (1995-10-01), Reinberg
patent: 5472811 (1995-12-01), Vasudev et al.
patent: 5477058 (1995-12-01), Sato
patent: 5482799 (1996-01-01), Isao et al.
patent: 5547787 (1996-08-01), Ito et al.
patent: 5578402 (1996-11-01), Watanabe
patent: 5693568 (1997-12-01), Liu et al.
patent: 5725973 (1998-03-01), Han et al.
patent: 5756396 (1998-05-01), Lee et al.
patent: 5932377 (1999-08-01), Ferguson et al.
patent: 5935733 (1999-08-01), Scott et al.
patent: 5939227 (1999-08-01), Smith
patent: 5955222 (1999-09-01), Hibbs et al.
patent: 6187480 (2001-02-01), Huang
patent: 6291113 (2001-09-01), Spence
patent: 6335130 (2002-01-01), Chen et al.
patent: 6355557 (2002-03-01), Stinnett et al.
patent: 6492069 (2002-12-01), Wu et al.
patent: 6743553 (2004-06-01), Shiota et al.
patent: 6780548 (2004-08-01), Kalk
patent: 2001/0044056 (2001-11-01), Kokubo
patent: 2-39153 (1990-02-01), None
patent: 7-104457 (1995-04-01), None
patent: 8-76353 (1996-03-01), None
patent: 2001-174973 (2001-06-01), None
Canon Presentation, “Canon's IDEAL: Innovative Double Exposure by Advanced Lithography,” BACUS News, SPIE, Apr. 2001, vol. 17, Issue 4, p. 1-7.
T. Ebihara, T. Oga, P.D. Rhyins, M. Sweis, P.M. Martin, “150-nm dense/isolated contact hole study with Canon IDEAL technique”, SPIE Proceeding 4562-119.
R.L. Kosetelak, C. Pierrat, J.G. Garofalo, and S. Vaidya, “Exposure characteristics of alternate aperture phase-shifting masks fabricated using a subtractive process”, J. Vac. Sci. Tech. B0, 3055-3061 (1992).
M.D. Levenson, N.S. Viswanathan, and R.A. Simpson, “Improving Resolution with a Phase-Shifting Mask”, IEEE Trans. Elect. Dev. ED-29, 1828-1836 (1982).
K.D. Lucas, C.M. Yuan, and A.J. Stroljwas, “A rigorous and practical vector model for phase shigting masks in optical lithography”, Proc. SPIE 1674, 252-263 (1992).
Armin Semmler, L. Mader, A. Elsner, R. Koehle, U. Griesinger, C. Noelscher, “Application of 3D EMF Simulation for Development and Optimization of Alternating Phase Shifting Masks”, Optical Microlithography XIV, Proceedings of SPIE, 2001, P. 356-367, vol. 4346 (Christopher J. Progler, ed.).
Peng, Song, “Through-Focus Image Balancing of Alternating Phase Shifting Masks”, SPIE vol. 3873, p. 328-336 (1999).
T. Terasawa, N. Hasegawa, A. Imai and S. Okazaki, “Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics”, Japanese J. Appl. Phys. 34, 6578-6583 (1995).
T. Teresawa, N. Hasegawa, T. Tanaka, S. Katagiri, and T. Kurosaki, “Improved Resolution of an i-line stepper using a phase-shift mask”, J.Vac. Sci. Tech. B8, 1300-1308, (1990).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alternating aperture phase shift photomask having light... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alternating aperture phase shift photomask having light..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alternating aperture phase shift photomask having light... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3474461

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.