Alkylsilanes as solvents for low vapor pressure precursors

Details Alkylsilanes as solvents for low vapor pressure precursors Alkylsilanes as solvents for low vapor pressure precursors

2007-11-13

2007-11-13

Carrillo, Sharidan (Department: 1746)

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

C134S022110, C134S022140, C134S022160, C134S022170, C134S022190, C134S026000, C134S034000, C134S036000, C134S042000, C134S902000

Reexamination Certificate

active

11456259

ABSTRACT:
Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at least one alkylsilane. In another embodiment, a method of removing at least one chemical precursor from a semiconductor fabrication system comprises forcing a solvent containing at least one alkylsilane through the semiconductor fabrication system and dissolving the at least one chemical precursor in the solvent. The solvent may also contain mixtures of different alkylsilanes and other organic solvents.

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Database WPI Week 199727, Derwent Publications Ltd., London, GB; AN 1997-295280, XP002431471 & JP 09 111299 (Sumitomo Chem. Co. Ltd.), Apr. 28, 1997 Abstract.

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