Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
2000-01-18
2000-10-03
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430329, 510176, G03C 530, G03F 732, D11D 158
Patent
active
061271012
ABSTRACT:
This invention provides water-based compositions, particularly coating, ink, fountain solution, adhesive, agricultural and photoresist developing/electronics cleaning compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain alkylated aminoalkylpiperazine compounds of the structure ##STR1## where one of R.sup.1 and R.sup.2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both or R.sup.1 and R.sup.2 are C5 to C8 alkyl groups, and n is 2 or 3.
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Carr Richard V. C
Lassila Kevin Rodney
Minnich Kristen Elaine
Air Products and Chemicals Inc.
Le Hoa Van
Leach Michael
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