Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-07-15
2008-07-15
Schilling, Richard (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S326000, C430S331000
Reexamination Certificate
active
11493629
ABSTRACT:
A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
REFERENCES:
patent: 3029145 (1962-04-01), Dumers et al.
patent: 3697275 (1972-10-01), Hayakawa et al.
patent: 3782944 (1974-01-01), Hayakawa et al.
patent: 4547450 (1985-10-01), Maeda et al.
patent: 5984540 (1999-11-01), Mimasaka et al.
patent: 6076979 (2000-06-01), Mimasaka et al.
patent: 6089762 (2000-07-01), Mimasaka et al.
patent: 6372413 (2002-04-01), Ema et al.
patent: 6423144 (2002-07-01), Watanabe
patent: 6579382 (2003-06-01), Ito
patent: 6709531 (2004-03-01), Ito et al.
patent: 2001/0018168 (2001-08-01), Kosa et al.
patent: 2001/0028920 (2001-10-01), Ito et al.
patent: 2002/0136971 (2002-09-01), Ito et al.
patent: 2002/0155391 (2002-10-01), Takahashi et al.
patent: 597100 (1994-05-01), None
patent: 4-162514 (1992-06-01), None
patent: 5-11458 (1993-01-01), None
patent: 5-303207 (1993-11-01), None
patent: 6-77123 (1994-03-01), None
patent: 6-95396 (1994-04-01), None
patent: 9-106081 (1997-04-01), None
patent: 10-99764 (1998-04-01), None
patent: 10-189419 (1998-07-01), None
patent: 10-303103 (1998-11-01), None
patent: 11-288877 (1999-10-01), None
patent: 2000-147793 (2000-05-01), None
patent: 2000-279902 (2000-10-01), None
patent: 2000-338684 (2000-12-01), None
patent: 2001-79504 (2001-03-01), None
patent: 2001-244164 (2001-09-01), None
patent: 2001-286833 (2001-10-01), None
patent: 3225101 (2001-11-01), None
patent: WO 99/60448 (1999-11-01), None
patent: WO 00/07220 (2000-02-01), None
Office Action dated Dec. 10, 2004, issued by Chinese Patent Office in Chinese Patent Application No. 02119275.8.
Notification of Reasons for Rejection issued by the Japanese Patent Office on May 15, 2007, for Japanese Patent Application No. 2001-143682, and English-language translation thereof.
Notification of Reasons for Rejection issued by the Japanese Patent Office on Nov. 28, 2006, for Japanese Patent Application No. 2001-143682, and English-language translation thereof.
Hayasaki Kei
Ito Shin'ichi
Takahashi Riichiro
Takeishi Tomoyuki
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Schilling Richard
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