Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-08-29
2006-08-29
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S325000, C430S326000, C430S327000, C430S328000, C430S331000
Reexamination Certificate
active
07097960
ABSTRACT:
A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.
REFERENCES:
patent: 3029145 (1962-04-01), Dumers et al.
patent: 3697275 (1972-10-01), Hayakawa et al.
patent: 3782944 (1974-01-01), Hayakawa et al.
patent: 4547450 (1985-10-01), Maeda et al.
patent: 5984540 (1999-11-01), Mimasaka et al.
patent: 6076979 (2000-06-01), Mimasaka et al.
patent: 6089762 (2000-07-01), Mimasaka et al.
patent: 6372413 (2002-04-01), Ema et al.
patent: 6423144 (2002-07-01), Watanabe
patent: 6709531 (2004-03-01), Ito et al.
patent: 2002/0136971 (2002-09-01), Ito et al.
patent: 2002/0155391 (2002-10-01), Takahashi et al.
patent: 5-303207 (1993-11-01), None
patent: 6-95396 (1994-04-01), None
patent: 9-106081 (1997-04-01), None
patent: 10-99764 (1998-04-01), None
patent: 10-189419 (1998-07-01), None
patent: 10-303103 (1998-11-01), None
patent: 11-288877 (1999-10-01), None
patent: 2001-244164 (2001-09-01), None
patent: 2001-286833 (2001-10-01), None
patent: 3225101 (2001-11-01), None
Office Action dated Dec. 10, 2004, issued by Chinese Patent Office in Chinese Patent application No. 02119275.8.
Hayasaki Kei
Ito Shin'ichi
Takahashi Riichiro
Takeishi Tomoyuki
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Schilling Richard L.
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