Alkaline organic photoresist stripper

Details Alkaline organic photoresist stripper Alkaline organic photoresist stripper

1998-03-27

1999-10-05

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430329, 134 38, G03C 500, B08B 700

Patent

active

059621974

ABSTRACT:
A stripper for removing photoresist or solder masks has a composition of 30-80% by weight of a propylene glycol ether; 10-60% by weight of a pyrrolidone; 0.1-5% by weight of potassium hydroxide; 0.1-10% by weight of a surfactant; 0-20% by weight 1,3-butanediol; 0-10% by weight 2-(2-aminoethoxy) ethanol; and a water content of <1%.

REFERENCES:
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patent: 4744834 (1988-05-01), Haq
patent: 4765844 (1988-08-01), Merrem et al.
patent: 4992108 (1991-02-01), Ward et al.
patent: 5290365 (1994-03-01), Whitton
patent: 5472830 (1995-12-01), Honda
patent: 5529887 (1996-06-01), Horn et al.
patent: 5597678 (1997-01-01), Honda et al.

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