Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1996-10-11
1998-06-16
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430300, 430302, G03C 5305
Patent
active
057668264
ABSTRACT:
An alkaline developing composition for processing a lithographic printing plate includes an alkali metal silicate and at least 6 weight % of a thickener such as glycerine. The lithographic printing plate can be either positive- or negative-working, and includes negative-working thermal plates.
REFERENCES:
patent: 3615480 (1971-10-01), Lam
patent: 3650745 (1972-03-01), Hackmann et al.
patent: 4116851 (1978-09-01), Rupe et al.
patent: 4259434 (1981-03-01), Yamasue et al.
patent: 4451393 (1984-05-01), Watanabe et al.
patent: 4452731 (1984-06-01), Watanabe et al.
patent: 4452880 (1984-06-01), Seino et al.
patent: 4469776 (1984-09-01), Matsumoto et al.
patent: 4576903 (1986-03-01), Baron et al.
patent: 4643840 (1987-02-01), Brocklehurst et al.
patent: 4945030 (1990-07-01), Tuner et al.
patent: 5076952 (1991-12-01), Ahmed
patent: 5164286 (1992-11-01), Blakeney et al.
patent: 5229027 (1993-07-01), Ahmed
patent: 5234796 (1993-08-01), Shimura et al.
patent: 5250393 (1993-10-01), Imai et al.
patent: 5380623 (1995-01-01), Miller et al.
patent: 5462689 (1995-10-01), Choy et al.
patent: 5480762 (1996-01-01), Toyama et al.
patent: 5565419 (1996-10-01), Thomas et al.
Felker Melanie Ann
Miller Gary Roger
Eastman Kodak Company
Le Hoa Van
Tucker J. Lanny
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