Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-08-24
1990-06-12
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430287, 522100, 522101, 522102, 522103, 525502, 525507, 525922, G03C 168
Patent
active
049332597
ABSTRACT:
A composition useful as an alkaline developable liquid photoimageable solder resist ink comprising a photocurable resin, a photopolymerization initiator, a reactive diluent, a solvent and optionally, a thermosetting material as main components wherein the photocurable resin comprises a reaction product of: (A) an epoxy vinyl ester resin obtained by reacting a cresol novolak epoxy resin and an unsaturated monobasic acid, (B) a polybasic acid anhydride and (C) an alkyl ketene dimer, wherein the hydroxyl value of the photocurable resin is not more than 10 carbons. Coating films formed from the subject composition have excellent adhesion, heat resistance, moisture insulation resistance and alkaline developable properties.
REFERENCES:
patent: 3661576 (1972-05-01), Crary
patent: 3980483 (1976-09-01), Nishikubo
patent: 4003877 (1977-01-01), Lipson et al.
patent: 4064287 (1977-12-01), Lipson et al.
patent: 4101398 (1978-07-01), Hesse et al.
patent: 4162274 (1979-07-01), Rosenkranz
patent: 4252888 (1981-02-01), Rohloff
patent: 4390615 (1983-06-01), Courtney et al.
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4485166 (1984-11-01), Herwig et al.
patent: 4540752 (1985-09-01), McFadden
patent: 4544623 (1985-10-01), Audykowski et al.
patent: 4786579 (1988-11-01), Tazawa et al.
Chihara Machio
Funahashi Mitsukazu
Arakawa Chemical Industries Ltd.
Brammer Jack P.
LandOfFree
Alkaline developable liquid photoimageable solder resist ink com does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Alkaline developable liquid photoimageable solder resist ink com, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alkaline developable liquid photoimageable solder resist ink com will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-616791