Alkaline-containing photoresist stripping compositions producing

Details Alkaline-containing photoresist stripping compositions producing Alkaline-containing photoresist stripping compositions producing

1992-11-06

1994-05-03

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430325, 430326, 430311, 430256, 430260, G03C 500

Patent

active

053087453

ABSTRACT:
Addition of non-nitrogen containing weak acids to amine-containing alkaline strippers for photoresists produce stripper compositions able to strip highly cross-linked or hardened photoresist films without producing any substantial metal corrosion. Weak acids useful in the stripping compositions include those having a pK in aqueous solution of 2.0 or higher and an equivalent weight of less than about 140 and are employed in an amount to neutralize from about 19% to about 75% of the amine present in the stripper composition.

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Ambat, R. et al., Corrosion Science, vol. 33 No. 5, pp. 681-690 (1992).
Pai, P. et al., Proc. Interface, pp. 137-148 (1989).

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