Alkali-soluble siloxane polymer, positive type resist...

Details Alkali-soluble siloxane polymer, positive type resist... Alkali-soluble siloxane polymer, positive type resist...

2005-09-27

2005-09-27

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S272100, C430S311000, C430S313000, C430S319000, C430S320000, C528S010000

Reexamination Certificate

active

06949324

ABSTRACT:
A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation;in the Formula (1), R1and R2express a monovalent organic group, and may be identical or different;“A” is a group expressed by the following Formula (2) having at least one phenolic hydroxyl group; and “a”, “b,” and “c” satisfy the following relation; a+b+c=1,in the Formula (2), R3, R4, and R5express one of a hydrogen atom and a monovalent organic group, and may be identical or different, “m” expresses an integer, and “n” expresses an integer of 1 to 5.Preferably, 0.25≦a≦0.60, and 0≦c≦0.25. The composition is preferably used in a resist film undergoing oxygen plasma etching.

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