Alkali-soluble resin with polyaromatic group and...

Details Alkali-soluble resin with polyaromatic group and... Alkali-soluble resin with polyaromatic group and...

2006-08-15

2006-08-15

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S285100, C430S910000, C430S916000, C526S284000, C525S132000, C525S327300, C525S384000

Reexamination Certificate

active

07090962

ABSTRACT:
An alkali-soluble resin having a polyaromatic group and a photosensitive composition comprising the alkali-soluble resin. The alkali-soluble resin comprises the following recurring units:wherein each of R1, R2, and R3, independently, is H or CH3; R4is a substituted or unsubstituted polyaromatic derivative containing carbon and optionally containing one or more heteroatoms of oxygen, nitrogen and sulfur; X is alkyl, benzyl, or hydroxyl; each of n1and n2, independently, is an integer of 0–8; and a, b, and c are integers when a and c respectively are not zero.

REFERENCES:
patent: 4699870 (1987-10-01), Iwadate et al.
patent: 5395721 (1995-03-01), Kato et al.
patent: 6013415 (2000-01-01), Sakurai et al.
patent: 6087050 (2000-07-01), Itano et al.
patent: 2002/0015901 (2002-02-01), Takebe et al.
patent: 11095425 (1999-04-01), None

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