Alkali developable photopolymer crystalline composition

Details Alkali developable photopolymer crystalline composition Alkali developable photopolymer crystalline composition

1984-12-06

1985-11-26

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430910, 430920, 20415915, 20415916, G03C 168

Patent

active

045554730

ABSTRACT:
Photopolymerizable crystalline composition having a crystallinity index of at least 0.2 which comprises: (a) at least one ethylenically unsaturated monomer, (b) at least one photoinitiator, (c) at least one acidic polymeric binder and (d) a crystalline matrix forming compound having a melting point of 50.degree. to 200.degree. C. The compositions are useful in film form as photoresists, litho films, etc.

REFERENCES:
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patent: 3871885 (1975-03-01), Hertler
patent: 3887450 (1975-06-01), Gilano et al.
patent: 3930865 (1976-01-01), Faust et al.
patent: 4186067 (1980-01-01), Muzyczko et al.
patent: 4245030 (1981-01-01), Faust et al.
patent: 4273857 (1981-06-01), Leberzammer et al.
patent: 4361640 (1982-11-01), Pine
patent: 4465572 (1984-08-01), Graham
patent: 4485167 (1984-11-01), Briney et al.
Hertler et al., Crystalline Matric Photoimaging, Photographic Science and Engineering, 23, No. 5, Sep./Oct. 1979.

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