Alignment tool for a lithographic apparatus

Details Alignment tool for a lithographic apparatus Alignment tool for a lithographic apparatus

2006-03-27

2008-12-02

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S521000, C356S499000

Reexamination Certificate

active

07460231

ABSTRACT:
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.

REFERENCES:
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patent: 5977539 (1999-11-01), Holzapfel et al.
patent: 6005667 (1999-12-01), Takamiya et al.
patent: 6297876 (2001-10-01), Bornebroek
patent: 7050675 (2006-05-01), Zhou
patent: 2007/0114678 (2007-05-01), Van Haren et al.
patent: 98/39689 (1998-09-01), None
P. Lalanne et al., “Design and Fabrication of Blazed Binary Diffractive Elements with Sampling Periods Smaller than the Structural Cutoff,” Optical Society of America (1999), Josa A, vol. 16, Issue 5, pp. 1143-1156.

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