Alignment systems and methods for lithographic systems

Details Alignment systems and methods for lithographic systems Alignment systems and methods for lithographic systems

2006-12-22

2008-10-21

Lee, John R. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C250S559300, C355S053000, C700S114000

Reexamination Certificate

active

07439531

ABSTRACT:
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

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