Alignment system of semiconductor exposure apparatus and...

Details Alignment system of semiconductor exposure apparatus and... Alignment system of semiconductor exposure apparatus and...

2005-02-08

2005-02-08

Lauchman, Layla (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S400000

Reexamination Certificate

active

06853451

ABSTRACT:
A system for detecting the state of alignment between a reticle and a wafer of a semiconductor exposure apparatus includes a light source, a beam transfer unit, a projection lens, an alignment detector, a controller, and an alarm device. The alignment detector includes a diaphragm, and a photodiode sensor mounted on the incident side of the diaphragm. The photodiode sensor will generate a current when impinged by secondary or higher order beams, i.e. beams other than a +/−primary beam or a titled +/−primary beam. The controller receives current from the photodiode sensor and operates the alarm when the current exceeds a predetermined value.

REFERENCES:
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patent: 4749278 (1988-06-01), van der Werf
patent: 5214489 (1993-05-01), Mizutani et al.
patent: 5496669 (1996-03-01), Pforr et al.
patent: 5917604 (1999-06-01), Dirksen et al.
patent: 6243601 (2001-06-01), Wist
patent: 6297876 (2001-10-01), Bornebroek

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