Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2005-04-12
2005-04-12
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S121000, C438S401000
Reexamination Certificate
active
06879868
ABSTRACT:
An alignment system for a lithographic apparatus includes a detection system arranged in a path of at least a portion of an alignment radiation. The alignment system also includes a position determining unit in communication with the detection system. The position determining unit is adapted to measure a position of at least one alignment mark on a substrate. The substrate is overlaid with a layer of deposited material. A calculating unit is coupled to the position determining unit. The calculating unit calculates a corrected position of the alignment mark on the basis of the position of the at least one alignment mark being measured and a model of a process apparatus involved in a deposition of the layer of deposited material. The model taking into account an amount of deposition of the layer of deposited material.
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Mos Everhardus Cornelis
Van Der Schaar Maurits
ASML Netherlands B.V.
Kosowski Alexander
Picard Leo
Pillsbury & Winthrop LLP
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