Alignment system for exposure apparatus

Details Alignment system for exposure apparatus Alignment system for exposure apparatus

1989-08-17

1990-10-09

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

049623184

ABSTRACT:
An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer. The apparatus is comprised of first and second detectors and a determination unit. The first detector includes a light-emitting system for generating first light to illuminate first marks on the substrate and provides first position data. The second mark position detector includes a light-emitting system for generating second light having a wider wavelength distribution than that of the first light to illuminate second marks on the substrate and provides second position data. Determination unit (EGA operational unit 502 or the like) is provided for determining the position of the substrate as a whole by using both of the first and second position data.

REFERENCES:
patent: 4385838 (1983-05-01), Nakazawa et al.
patent: 4402596 (1983-09-01), Kanatani
patent: 4566795 (1986-01-01), Matsurra et al.
patent: 4655598 (1987-04-01), Murakami et al.
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4798962 (1989-01-01), Matsumoto et al.

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