Alignment system and lithographic apparatus equipped with...

Details Alignment system and lithographic apparatus equipped with... Alignment system and lithographic apparatus equipped with...

2007-10-16

2007-10-16

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C355S053000, C355S077000, C257S797000, C438S401000, C430S022000, C430S030000

Reexamination Certificate

active

10882683

ABSTRACT:
A marker structure on a substrate includes line elements and trench elements, the line elements and trench elements each having a length in a first direction and being arranged in an alternating repetitive sequence in a second direction perpendicular to the first direction, the alternating repetitive sequence having a sequence length, the marker structure having at least one pitch value, the at least one pitch value being the sum of a line width of one line element and a trench width of one trench element. A width of the line elements varies over the sequence length of the marker structure between a minimum line width value and a maximum line width value, while a width of the trench elements likewise varies over the sequence length of the marker structure between a minimum trench width value and a maximum trench width value. A duty cycle of a pair of a line element and an adjacent trench element is substantially constant over the sequence length of the marker structure. Thus, the pitch value varies from a minimum pitch value to a maximum pitch value over the sequence length.

REFERENCES:
patent: 6995831 (2006-02-01), Levasier et al.
patent: 7002667 (2006-02-01), Levasier et al.

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