Alignment routine for optically based tools

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

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Details

C382S151000, C355S077000, C430S030000

Reexamination Certificate

active

10604010

ABSTRACT:
A method is provided for using a point of interest as a starting point where an alignment is automatically selected by recognition software for a patterned substrate. The method includes disposing the patterned substrate on a stage of an exposure system, the exposure system having an alignment routine including; locating a first point of interest on the patterned substrate; scanning a first area proximate the first point of interest for a first unique feature; defining a periodicity for the patterned substrate; locating a second point of interest based on the periodicity; scanning a second area proximate the second point of interest for a second unique feature corresponding to the first unique feature; gathering alignment data from at least scanning the first and second areas; and determining substrate position relative to the exposure system from alignment data of at least the first and second scanned areas.

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patent: 6801825 (2004-10-01), Utsunomiya
patent: 1124163 (2001-08-01), None

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