Alignment reticle for a semiconductor wafer stepper system and m

Details Alignment reticle for a semiconductor wafer stepper system and m Alignment reticle for a semiconductor wafer stepper system and m

1986-11-07

1988-09-06

LaRoche, Eugene R.

Optics: measuring and testing

By alignment in lateral direction

356401, G01B 1100

Patent

active

047688831

ABSTRACT:
In a semiconductor wafer stepper system, a reticle having an alignment mark positioned adjacent the center thereof and utilized to align each wafer in the stepper system, as well as to adjust the stepper software of the system.

REFERENCES:
patent: 4388386 (1983-06-01), King et al.
patent: 4402610 (1983-09-01), Lacombat
patent: 4592648 (1986-06-01), Tabarelli et al.
patent: 4595295 (1986-06-01), Wilczynski
patent: 4662754 (1987-05-01), Mayer
Khoury, H. A., and H. R. Rottman, "Alignment System For Projection Mask", IBM Technical Disclosure Bulletin, vol. 13, No. 3, Aug. 1970, p. 768.

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