Alignment of lithographic system

Details Alignment of lithographic system Alignment of lithographic system

1988-05-26

1990-05-08

Willis, Davis L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, G01B 902

Patent

active

049233017

ABSTRACT:
A method for lithographic alignment utilized in the manufacture of integrated circuits is described. The procedure includes an initial calibration through the lens system to expose a calibration material in a diffraction grating pattern. An interference pattern is produced above the grating with intersecting laser beams. By adjusting the path and/or phase of these beams the interference pattern is aligned with the diffraction pattern to establish a calibration point corresponding to a reference intensity in the intensity of the diffracted light. A wafer to be exposed is then placed in the exposure tool and is aligned by observing the diffraction pattern from a diffraction grating fiducial mark induced by the calibrated interference pattern.

REFERENCES:
patent: 4402610 (1983-09-01), Lacombat
patent: 4631416 (1986-12-01), Trutna, Jr.
VLSI Electronics, N. Einspruch, ed., p. 320, Academic Press, 1987.

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