Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-02-14
1997-03-18
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118729, 156345, 269 56, 20429815, C23C 1600
Patent
active
056118651
ABSTRACT:
Centering pins mounted to a susceptor in a vacuum chamber align a glass substrate with respect to the susceptor on which it is supported, and with respect to a shadow frame which overlies the periphery of the substrate and protects the edge and underside of the substrate from undesired processing.
Shaped pins loosely mounted in openings in the susceptor so that the pins extend above the upper surface of the susceptor support the centered glass substrate during the transporting stages, but recess into the heated susceptor during processing.
REFERENCES:
patent: 4842683 (1988-04-01), Cheng
patent: 4990047 (1989-05-01), Wagner
patent: 5037262 (1989-07-01), Moll
patent: 5090900 (1990-09-01), Rudolf
Joint Development Agreement Between Applied Materials, Inc. (Applicant's Assignee) and two unrelated companies (Companies A & B), dated May 29, 1991 (Exhibit A hereto).
Berkstresser David E.
Petersen Carl T.
White John M.
Applied Materials Inc.
Bueker Richard
Edelman Lawrence
Morris Birgit E.
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