Alignment method for use in an exposure system

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

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G03F 900

Patent

active

056746512

ABSTRACT:
An alignment method for aligning a plurality of areas on a substrate with predetermined positions, comprising the steps of (1) measuring the array coordinates of n sample shots where an initial value of n is N, and obtaining three times the standard deviation of the nonlinear error components by processing the results of the measurement; (2) calculating an evaluation value A.sub.n by dividing the value obtained in the step (1) by a predetermined function; (3) for (n-1) sample shots which are obtained by removing a sample shot in which the nonlinear error component is largest, obtaining an evaluation value A.sub.n-1 from three times the standard deviation of the nonlinear error components, and hereinafter in the same way subsequently removing sample shots in which the nonlinear error component is large and calculating evaluation values A.sub.n-2, A.sub.n-3, . . . ; and (4) removing a sample shot in which the nonlinear error component is largest, as a jump shot, in a range where the evaluation value A.sub.n is larger than an average value <A.sub.n > of the calculated evaluation values.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4833621 (1989-05-01), Umatate et al.
patent: 4962318 (1990-10-01), Nishi
patent: 5493402 (1996-02-01), Hirukawa

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