Alignment method for positioning a plurality of shot areas on a

Details Alignment method for positioning a plurality of shot areas on a Alignment method for positioning a plurality of shot areas on a

1996-09-25

1998-06-02

Le, Que

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, H01L 2178, G01B 1126

Patent

active

057604118

ABSTRACT:
Two laser beams with a frequency difference are applied to a wafer mark on a wafer from an LIA (Laser Interferometric Alignment) system through a projection optical system, and diffracted light beams generated from the wafer mark are received by first to third light-receiving devices, respectively, in the LIA. The first light-receiving device receives first interference light comprising .+-.1st-order diffracted light beams (first processing mode). The second and third light-receiving devices respectively receive second and third interference lights comprising zeroth-order light and 2nd-order diffracted light (second processing mode). Alignment is effected by using either of the two processing modes which gives better measurement reproducibility.

REFERENCES:
patent: 5118953 (1992-06-01), Ota et al.
patent: 5160849 (1992-11-01), Ota et al.
patent: 5561606 (1996-10-01), Ota et al.

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