Alignment measurement arrangement and alignment measurement...

Details Alignment measurement arrangement and alignment measurement... Alignment measurement arrangement and alignment measurement...

2005-08-16

2008-08-19

Lauchman, L. G. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S400000

Reexamination Certificate

active

07414722

ABSTRACT:
The invention provides an alignment measurement arrangement having a broadband source, an optical system and a detector. The broadband source is arranged to generate a radiation beam with a first and second range of wavelengths. The optical system is arranged to receive the generated radiation beam, produce an alignment beam, direct the alignment beam to a mark located on an object, to receive alignment radiation back from the mark, and to transmit the alignment radiation. The detector is arranged to receive the alignment radiation and to detect an image of the alignment mark located on the object. The detector furthermore produces a first and a second alignment signal, respectively, associated with said first and second range of wavelengths, respectively. The alignment measurement arrangement finally has a processor, which is connected to the detector. The processor is arranged to receive the first and second alignment signal, to determine a first and second signal quality respectively of the first and second alignment signal respectively by using a signal quality indicating parameter, and to calculate a position of the alignment mark based on the first and second signal quality.

REFERENCES:
patent: 6744512 (2004-06-01), Takahashi
patent: 7265841 (2007-09-01), Matsumoto
patent: 2005/0195398 (2005-09-01), Adel et al.
N.R. Farrar et al., Integrated Circuit Metrology, Inspection and Process Control VI, SPIE vol. 1673, (1992), p. 369-380.
K. Ota et al., Optical/Laser Microlithography IV, SPIE, vol. 1463, (1991), p. 304-314.

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