Alignment mark and aligning method using the same

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

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G01B 1100

Patent

active

054063736

ABSTRACT:
An alignment mark on a substrate for aligning the substrate includes a plurality of mark portions having different levels relative to the surface of the substrate. A method of aligning a substrate when a pattern on a mask is to be transferred onto the substrate includes forming an alignment mark on a surface of the substrate, the alignment mark including a plurality of mark portions having different levels relative to the surface of the substrate, illuminating the surface of the substrate with light, detecting an apparent position of each of the mark portions from light reflected from the surface of the substrate, calculating the position of a reference point having zero depth from the difference in the levels of the mark portions and the detected apparent position of each of the mark portions, and aligning the substrate in response to the calculated position of the reference point.

REFERENCES:
patent: 4632557 (1986-12-01), Thompson

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