Alignment mark

Details Alignment mark Alignment mark

2007-11-05

2010-10-26

Chowdhury, Tarifur R. (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S399000

Reexamination Certificate

active

07821638

ABSTRACT:
An alignment mark on a substrate includes a first pattern and a second pattern. The first pattern has a substantially planar upper surface by which parallel light is specularly reflected. The second pattern forms an interface with the first pattern and has a plurality of fine patterns. Parallel light is irregularly reflected by the second pattern.

REFERENCES:
patent: 4632557 (1986-12-01), Thompson
patent: 5294975 (1994-03-01), Norman et al.
patent: 5528372 (1996-06-01), Kawashima
patent: 5998295 (1999-12-01), Madurawe
patent: 6002182 (1999-12-01), Madurawe
patent: 6624524 (2003-09-01), Madurawe
patent: 03-101142 (1991-04-01), None
patent: 2000-089241 (2000-03-01), None
patent: 2000-182914 (2000-06-01), None
patent: 2004-319549 (2004-11-01), None

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