Alignment key structure in a semiconductor device and method...

Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks

Reexamination Certificate

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C257S758000, C438S106000

Reexamination Certificate

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07573142

ABSTRACT:
An alignment key structure in a semiconductor device is provided. The alignment key structure includes an insulation layer formed on a substrate, and a passivation layer pattern formed on the insulation layer. The insulation layer includes a plurality of metal wirings. The passivation layer pattern includes a first opening that exposes at least one of the metal wirings. Moreover, the first opening has a width which is narrower than a width of the exposed metal wiring.

REFERENCES:
patent: 6228743 (2001-05-01), Chen et al.
patent: 7223693 (2007-05-01), Choi et al.
patent: 7265050 (2007-09-01), Choi et al.
patent: 2006/0060945 (2006-03-01), Cho et al.
patent: 2006/0138673 (2006-06-01), Kim
patent: 2008/0203590 (2008-08-01), Kang et al.
patent: 2001-127240 (2001-05-01), None
patent: 1020040053451 (2004-06-01), None

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