Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Patent
1999-09-28
2000-11-28
Le, Que T.
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
2505593, 356401, G01N 2186
Patent
active
061538868
ABSTRACT:
An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directions to axial chromatic aberration and magnification chromatic aberration of the projection optical system between the mask and the substrate, wherein the alignment light is multi-colored light with a plurality of beams different in wavelength from each other in the wavelength region different from that of exposure light, and wherein the correction optical elements for irradiation light or the correction optical elements for detection light each are provided in correspondence with the plurality of beams different in wavelength.
REFERENCES:
patent: 4631416 (1986-12-01), Trutna, Jr.
patent: 4856905 (1989-08-01), Nishi
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5272501 (1993-12-01), Nishi et al.
patent: 5583609 (1996-12-01), Mizutani et al.
Hagiwara Shigeru
Mizutani Hideo
Ota Kazuya
Le Que T.
Nikon Corporation
LandOfFree
Alignment apparatus in projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Alignment apparatus in projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment apparatus in projection exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1728031