Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1996-09-26
1997-11-04
Hantis, K.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G01B 1100
Patent
active
056845952
ABSTRACT:
An alignment apparatus for aligning a first object (reticle) with a second object (wafer) when irradiating a projection light on the first object to project a pattern of the first object onto the second object through a projection optical system. The apparatus includes an illumination optical system for illuminating a plurality marks on the second object with an alignment light having a wavelength band different from the projection light, a detection optical system for receiving the alignment light from the illuminated mark through the projection optical system to detect an image of the mark formed by the alignment light, and a compensating optical system arranged within the detection optical system for compensating a chromatic aberration of magnification caused by the projection optical system due to the differences among the wavelengths within the wavelength band of the alignment light.
REFERENCES:
patent: 4435041 (1984-03-01), Torok et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4888614 (1989-12-01), Suzuki
patent: 5094539 (1992-03-01), Komoriya et al.
patent: 5161057 (1992-11-01), Johnson
Kato Masaki
Mizutani Hideo
Tanaka Masashi
Hantis K.
Meller Michael N.
Nikon Corporation
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