Alignment apparatus, aberration measuring method and aberration

Details Alignment apparatus, aberration measuring method and aberration Alignment apparatus, aberration measuring method and aberration

1999-10-07

2000-12-19

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

061633763

ABSTRACT:
In an alignment apparatus, an alignment mark formed on a substrate is illuminated through an illuminating optical system, and an image of the alignment mark is projected onto a light receiving surface of a CCD camera through an enlarging optical system. The enlarging optical system includes a parallel flat plate, the inclination of which can be adjustable, for parallel-translating an eccentric component of coma.

REFERENCES:
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patent: 6011611 (2000-01-01), Nomura et al.
Kawamura, E. et al., "Novel Optimization of Total Alignment Error Factors", Japanese Journal of Applied Physics, vol. 36, No. 12B, pp. 7512-7516, (1997).
Shiraishi, N. et al., "Alignment Strategies for Planarizing Technologies", SPIE, vol. 3051, pp. 836-845, (1997).

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