Alicyclic unsaturated compound, polymer, chemically...

Details Alicyclic unsaturated compound, polymer, chemically... Alicyclic unsaturated compound, polymer, chemically...

2004-03-04

2008-12-30

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S907000, C526S242000, C526S247000, C526S268000, C526S281000, C526S332000, C526S333000, C568S665000, C568S667000, C568S669000, C568S817000, C568S579000, C570S130000, C570S142000

Reexamination Certificate

active

07470499

ABSTRACT:
A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1and R2is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

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Notification Concerning Transmittal of Copy of International Preliminary Report on Patentability (Chapter 1 of the Patent Cooperation Treaty) Form PCT/IB/326 dated Sep. 22, 2005.

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