Air cleaning system for semiconductor manufacturing equipment

Details Air cleaning system for semiconductor manufacturing equipment Air cleaning system for semiconductor manufacturing equipment

2006-04-04

2006-04-04

Joyce, Harold (Department: 3749)

Ventilation

Clean room

C414S935000

Reexamination Certificate

active

07022009

ABSTRACT:
A cleaning system for n semiconductor manufacturing equipment includes a working area and a service area. A wafer process area in the service area performs a semiconductor manufacturing process. A wafer transfer area is spatially connected to the wafer process area, and transfers a wafer from the working area to the wafer process area. An air supply device supplies clean air to the wafer transfer area and the wafer process area. A particle measurer continuously checks for any malfunction or defect of the air supply device, and measures in real time an impurity particle count of the air in the wafer transfer area so as to detect any abnormally high pollution level in the wafer transfer area.

REFERENCES:
patent: 5008558 (1991-04-01), Koshinaka et al.
patent: 5328555 (1994-07-01), Gupta
patent: 5459569 (1995-10-01), Knollenberg et al.
patent: 5910727 (1999-06-01), Fujihara et al.
patent: 6476393 (2002-11-01), Yoshida et al.
patent: 2002/0062702 (2002-05-01), Bradley
patent: 2002/0163637 (2002-11-01), Rossman et al.
patent: 2003/0047012 (2003-03-01), Storbeck et al.
patent: 401136346 (1989-01-01), None

Affiliated with

Also associated with

Rating

Air cleaning system for semiconductor manufacturing equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Air cleaning system for semiconductor manufacturing equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Air cleaning system for semiconductor manufacturing equipment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3614415