Aftertreatment of relief plates using solution comprising a carb

Details Aftertreatment of relief plates using solution comprising a carb Aftertreatment of relief plates using solution comprising a carb

1988-11-28

1989-07-04

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430331, 430306, G03C 524, G03C 530, G03C 534

Patent

active

048450138

ABSTRACT:
Relief plates which are produced by imagewise photopolymerization of layers which contain, as binders, block copolymers of conjugated dienes and vinylaromatics are aftertreated with an aqueous solution of a mixture of bromates, bromides and acids by a process in which amidosulfonic acid and/or aliphatic di-, tri- and/or tetracarboxylic acids are used as the acids.

REFERENCES:
patent: 3255004 (1966-06-01), Thommes
patent: 3968316 (1976-07-01), Jyo et al.
patent: 4177074 (1979-12-01), Proskow
patent: 4400459 (1983-08-01), Gruetzmacher et al.
patent: 4400460 (1983-08-01), Fickes et al.
patent: 4451553 (1984-05-01), Fickes et al.
patent: 4452879 (1984-06-01), Fickes et al.
patent: 4460675 (1984-07-01), Gruetzmacher et al.
Patent Abstracts of Japan, vol. 7, No. 202 (P-221) [1347], Sep. 7, 1983.

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