Aerosol-plasma deposition of films for electrochemical cells

Details Aerosol-plasma deposition of films for electrochemical cells Aerosol-plasma deposition of films for electrochemical cells

1992-04-20

1993-11-09

King, Roy

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427569, 427565, 427226, 427421, 429 30, B05D 306, B05D 302

Patent

active

052601056

ABSTRACT:
An atmospheric process for the production of a coating or film for electrochemical cells is disclosed. In the first step of this process, an aerosol mist containing reactants necessary to form the desired coating or film is provided. Thereafter, the mist is subjected to radio-frequency radiation while in the plasma region. Thereafter, the vaporized mixture is then deposited onto a substrate.

REFERENCES:
patent: 4831965 (1989-05-01), Brian et al.
patent: 5032568 (1991-07-01), Lau et al.

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