Advanced illumination system for use in microlithography

Details Advanced illumination system for use in microlithography Advanced illumination system for use in microlithography

2007-03-06

2007-03-06

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S055000

Reexamination Certificate

active

10896022

ABSTRACT:
A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

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