Advance ridge structure for microlens gapless approach

Details Advance ridge structure for microlens gapless approach Advance ridge structure for microlens gapless approach

2007-09-04

2007-09-04

Tsai, H. Jey (Department: 2812)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S024000, C438S048000, C438S070000, C438S073000, C438S698000, C257SE33068

Reexamination Certificate

active

11064452

ABSTRACT:
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of patterned photoresist features each disposed within one of the plurality of openings. The plurality of patterned photoresist features can then be reflowed inside the grid.

REFERENCES:
patent: 5593913 (1997-01-01), Aoki
patent: 5900655 (1999-05-01), Shim
patent: 6043481 (2000-03-01), Tan et al.
patent: 6221687 (2001-04-01), Abramovich
patent: 6803250 (2004-10-01), Yaung et al.
patent: 7052921 (2006-05-01), Plat et al.
patent: 2004/0263665 (2004-12-01), Yamamoto
patent: 2005/0200960 (2005-09-01), Tang
patent: 2005/0287479 (2005-12-01), Moon
Ghandhi, VLSI Fabrication Principles, 1983, John Wiley & Sons, pp. 542-546.

Affiliated with

Also associated with

Rating

Advance ridge structure for microlens gapless approach does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Advance ridge structure for microlens gapless approach, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Advance ridge structure for microlens gapless approach will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3785856