Adjustable shielding plate for adjusting an etching area of...

Details Adjustable shielding plate for adjusting an etching area of... Adjustable shielding plate for adjusting an etching area of...

2005-04-29

2008-10-21

Cleveland, Michael (Department: 1792)

Coating apparatus

With means to apply electrical and/or radiant energy to work...

Electrostatic and/or electromagnetic attraction or...

C118S715000, C118S7230ER, C118S7230AN, C156S345300, C156S345440, C156S345450, C156S345460, C156S345470

Reexamination Certificate

active

07438765

ABSTRACT:
An apparatus for adjusting an etching area of a semiconductor wafer includes an adjustable shielding plate. The adjustable shielding plate includes a plurality of shielding members. Each of the plurality of shielding members are movable between a first position configured to shield a portion of a semiconductor wafer from an etching gas and a second position configured to expose an unshielded etching portion of the semiconductor wafer to the etching gas.

REFERENCES:
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patent: 2002/0102754 (2002-08-01), Fujimori et al.
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patent: 2002/0162629 (2002-11-01), Jeon et al.
patent: 2003/0029567 (2003-02-01), Dhindsa et al.
patent: 2005/0173067 (2005-08-01), Lim
patent: 62067171 (1987-03-01), None
patent: 1020020029824 (2002-04-01), None
patent: 1020020080955 (2002-10-01), None
patent: 1020030060690 (2003-07-01), None

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