Adjustable lithography blocking device and method

Details Adjustable lithography blocking device and method Adjustable lithography blocking device and method

2003-06-11

2009-10-06

Vanore, David A (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S492100, C250S492200, C250S492300, C355S030000, C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

07598507

ABSTRACT:
The present invention provides, in one embodiment, a method (100) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate (110). A radiation path through the reticle and a window assembly located between a radiation source and resist (120), is considered. It is determined whether or not the radiation would expose a predefined blocking area of the resist within the exposure zone (130). If the radiation would expose a blocking area, then the window assembly is configured to prevent radiation from exposing the blocking area in the exposure zone (140). Other embodiments include a window assembly (300) and system (400) to facilitate manufacturing of the semiconductor device according to the method (100).

REFERENCES:
patent: 5041361 (1991-08-01), Tsuo
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6342941 (2002-01-01), Nei et al.

Affiliated with

Also associated with

Rating

Adjustable lithography blocking device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Adjustable lithography blocking device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Adjustable lithography blocking device and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4068015