Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-07-15
2000-04-18
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427531, 427533, C23C 1434
Patent
active
06051115&
ABSTRACT:
An adhesive strength increasing method which does not need a bulky apparatus such as an ion implantation apparatus and prevent the characteristic of a material from being degraded by using a high level current ion of a low level energy, thus increasing an adhesive strength between a metal thin film and a glass substrate. In the present invention, a metal is deposited on a substrate an inert gas or a reactive gas having a predetermined energy is irradiatd to the deposited metal thin film, and then the metal thin film is sealed, thus increasing an adhesive strength between a metal thin film and a glass substrate.
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Choi Won Kook
Jang Hong Kyu
Jung Hyung Jin
Koh Seok Keun
Korea Institute of Science and Technology
Nguyen Nam
Ver Steeg Steven H.
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