Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-02-13
2007-02-13
Norton, Nadine (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S710000, C134S001000, C134S001200
Reexamination Certificate
active
10888461
ABSTRACT:
Methods and apparatus for cleaning a semiconductor substrate that significantly reduce the number of particles falling onto the substrate during cleaning by coating all interior surfaces within a processing chamber with an adhesion film that has an increased sticking coefficient for any subsequently arriving etched species to promote a continuous film growth and improve adhesion of such etched species. Due to its increased sticking coefficient, this adhesion film reduces surface mobility of any arriving by-products to enable the growth of the continuous film of etched species. The continuous film of etched species adheres firmly to the adhesion film such that the etched species are prevented from flaking off and falling onto the substrate being cleaned. The methods and apparatus may clean a plurality of semiconductor substrates, whereby a plurality of adhesion films are sequentially deposited over a plurality of continuous film growths of removed materials for cleaning the substrates.
REFERENCES:
patent: 5236868 (1993-08-01), Nulman
patent: 5988187 (1999-11-01), Trussell et al.
patent: 2003/0013314 (2003-01-01), Ying et al.
patent: 2003/0183244 (2003-10-01), Rossman
Fair James A
Rivkin Michael
DeLio & Peterson LLC
Norton Nadine
Novellus Systems Inc.
Nowak Kelly M.
Umez-Eronini Lynette T.
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