Adhesion of a photoresist to a substrate

Details Adhesion of a photoresist to a substrate Adhesion of a photoresist to a substrate

1984-12-07

1985-06-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430271, 430272, 430275, 430313, 430317, 430319, G03C 500

Patent

active

045241260

ABSTRACT:
A process for improving the adhesion of a photoresist to a substrate by applying a layer of titanium, zirconium, hafnium and/or oxide thereof between the photoresist and substrate.

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patent: 4310569 (1982-01-01), Harrington
IBM Technical Disclosure Bulletin, vol. 9, No. 1, Jun. 1966, Schwariz, C. G.
IBM Technical Disclosure Bulletin, vol. 9, No. 1, Jun. 1966, Krongelb, S.

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