Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Patent
1986-04-23
1988-02-09
Anderson, Bruce C.
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
2504421, 2504922, 118500, 118730, H01J 3720
Patent
active
047243252
ABSTRACT:
An ion beam treatment system for treating silicon wafers placed in the ion beam path. A rotatably mounted wafer pedestal has a plurality of wafer supporting substrates spaced about the pedestal. The substrates are constructed from an elastomer that is chosen for its ability to transfer heat generated by ion collision with the wafers away from the wafers. Each wafer substrate defines a series of elongated depressions across its surface. Certain of these depressions are connected to a pressure source at a wafer loading/unloading station to help acquire the wafers during loading and to facilitate removal of the wafers during unloading. Other depressions vent the interface between the wafers and the substrate to atmosphere to avoid undue pressure build-up on the wafers as they lift off the substrate.
REFERENCES:
patent: 4139051 (1979-02-01), Jones et al.
patent: 4228358 (1980-10-01), Ryding
patent: 4247781 (1981-01-01), Bayer et al.
patent: 4282924 (1981-08-01), Furetra
patent: 4403567 (1983-09-01), de Costa et al.
Armstrong Allen E.
Benveniste Victor M.
Edwards, Jr. David
Anderson Bruce C.
Eaton Corporation
Guss Paul A.
Rowe D. A.
Sajovec F. M.
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