Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1999-01-21
2000-12-05
Ball, Michael W.
Coating apparatus
Gas or vapor deposition
Chamber seal
118 50, 118715, C23C 1600
Patent
active
061561258
ABSTRACT:
Disclosed is an adhesion apparatus for modifying a surface of a substrate with an adhesion promoter so as to improve the adhesive force of a solution coated on the substrate surface in a photolithography process, comprising a support for holding the substrate, the support having a first contact face, a vacuum suction port formed in the support in a manner to surround the substrate held on the support, a lid having a second contact face which can be brought into contact with the first contact face, a processing space being formed between the table and the lid when the second contact face of the lid is brought contact with the first contact face of the support, unit for supplying an adhesion promoter into the processing space, a first annular sealing member positioned intermediate between the first and second contact faces and outside the vacuum suction port so as to surround the processing space, and a second annular sealing member positioned intermediate between the first and second contact faces and inside the vacuum suction port so as to surround the processing space.
REFERENCES:
patent: 5505782 (1996-04-01), Stauffer
patent: 6045617 (2000-04-01), Keller
Ball Michael W.
Haran John T.
Tokyo Electron Limited
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