Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-12-22
1998-12-22
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419229, 20419215, 20419227, 20419228, 20419222, C23C 1434
Patent
active
058513663
ABSTRACT:
A method of improving adherence of a metal film deposited directly on a silicate glass substrate for a display panel. The method comprises chemically treating the surface of the glass to alter its surface characteristics and thereby improve adhesion robustness of the metal film to the glass surface.
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Belscher Kay M.
Morse Leroy R.
Okamoto Fumio
Sterlace B. Jean
Carlson Robert L.
Corning Incorporated
Nguyen Nam
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