Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-06-29
1998-08-11
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, C23C 1434
Patent
active
057923272
ABSTRACT:
A method of improving adherence of a metal film deposited directly on a silicate glass substrate for a display panel. The method comprises chemically treating the surface of the glass to alter its surface characteristics and thereby improve adhesion robustness of the metal film to the glass surface. In a specific embodiment the surface is treated with a mixed solution of hydrofluoric and hydrochloric acid.
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Belscher Kay M.
Bocko Peter L.
Morse Leroy R.
Okamoto Fumio
Carlson Robert L.
Corning Incorporated
Nguyen Nam
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