Addition of ethylenically unsaturated materials to control odor

Details Addition of ethylenically unsaturated materials to control odor Addition of ethylenically unsaturated materials to control odor

1978-02-08

1980-08-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 20415911, 20415918, 20415924, G03C 168, C08F 818, C08F 834

Patent

active

042185319

ABSTRACT:
The use of certain organic materials having non-aromatic carbon-carbon unsaturation is described in connection with photopolymerizable compositions containing aromatic sulfonium complex salt photoinitiators in order to minimize or eliminate the odor of organosulfur reaction by-products.

REFERENCES:
patent: 4058400 (1977-11-01), Crivello
patent: 4058401 (1977-11-01), Crivello
patent: 4069054 (1978-01-01), Smith
patent: 4108747 (1978-08-01), Crivello
patent: 4138255 (1978-02-01), Crivello
patent: 4156035 (1979-05-01), Tsao et al.

Affiliated with

Also associated with

Rating

Addition of ethylenically unsaturated materials to control odor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Addition of ethylenically unsaturated materials to control odor , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Addition of ethylenically unsaturated materials to control odor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1428315