Adaptive X-ray lithography mask

Details Adaptive X-ray lithography mask Adaptive X-ray lithography mask

1984-02-10

1986-05-27

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378205, 2504911, G21K 508

Patent

active

045920818

ABSTRACT:
Provided is an apparatus for improving alignment accuracy by distorting in a controlled manner an X-ray lithographic mask to compensate for mask distortions induced primarily by thermally induced clamping effects in E-beam and X-ray exposure systems. A system of additional alignment sensors is used to provide localized misalignment information. This information is then used to provide feedback to a servo system which in turn activates electromechanically translatable clamps which distort the X-ray mask so as to minimize misalignment over the exposure field.

REFERENCES:
patent: 4385434 (1983-05-01), Zehnpfenning et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4516253 (1985-05-01), Novak
patent: 4525852 (1985-06-01), Rosenberg
R. V. Jones, "Some Uses of Elasticity in Instrument Design," Journal of Scientific Instruments, vol. 39, May 1962, pp. 193-203.
M. G. Natrella, Experimental Statistics, National Bureau of Standards Handbook 91, Washington: U.S. Government Printing Office, Chapter 6, Aug. 1963.

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